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聚和材料:韩国SKE空白掩模版美国专利全部转至公司名下,上海掩膜版基地建 ...

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发表于 3 天前 | 显示全部楼层 |阅读模式
有投资者在互动平台向聚和材料提问:“董秘你好,韩国SKE空白掩模版在美国的相关专利,是否已经全部转移到公司名下?上海空白掩膜版生产基地建设进度是否符合预期?”
针对上述提问,聚和材料回应称:“尊敬的投资者,您好。韩国SKE空白掩模版在美国的相关专利,已全部转移至公司名下;上海空白掩膜版生产基地建设按期顺利进行。感谢您的关注!”
本文源自:市场资讯
作者:公告君
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